Is there a better way to improve electron beam liftoff deposition uniformity without sacrificing material efficiency?
Yes! It's called HULA – High Uniformity Liftoff Assembly. It replaces fixed-position wafer carriers and masks with a planetary motion system that time-averages wafer exposure across high and low flux zones. This results in:
✅ No Masks Needed
✅ <±3% Uniformity Across the Batch
✅ Up to 43% Higher Collection Efficiency
✅ Faster Runs & Higher Throughput
To learn more about HULA, contact our Thin Film Solutions team at [email protected]
#ThinFilm #ThinFilmSolutions #semiconductormanufacturing #semiconductor #FerroTecUSA
Yes! It's called HULA – High Uniformity Liftoff Assembly. It replaces fixed-position wafer carriers and masks with a planetary motion system that time-averages wafer exposure across high and low flux zones. This results in:
✅ No Masks Needed
✅ <±3% Uniformity Across the Batch
✅ Up to 43% Higher Collection Efficiency
✅ Faster Runs & Higher Throughput
To learn more about HULA, contact our Thin Film Solutions team at [email protected]
#ThinFilm #ThinFilmSolutions #semiconductormanufacturing #semiconductor #FerroTecUSA
Shared byJamie Garcia - 2 months ago
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